| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask provided with a non-resolution pattern having a desired pattern shape by preventing a resist pattern for forming the non-resolution pattern from falling into a state which differs from a desired shape and being transferred to a metal film on the photomask, in this state. <P>SOLUTION: The photomask includes a resolution pattern 1 for wiring and a non-resolution pattern 2 which is disposed apart from the resolution pattern 1 for wiring, in order to correct an optical adjacency effect of the resolution pattern 1 for wiring, and the non-resolution pattern 2 has a shape curved along its lengthwise direction, in plan view. <P>COPYRIGHT: (C)2010,JPO&INPIT |
