| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device whose light source can be adjusted at low cost in a short time. <P>SOLUTION: The exposure device 1 exposes a wafer 500 to a pattern of a reticle 300, and includes the light source 100, a lighting optical system 200 which lights up the reticle 300 using light from the light source 100, a projection optical system 400 which projects the pattern of the reticle 300 on the wafer 500, a measurement device 1000 which measures effective light source distribution at a plurality of points on a surface of the reticle 300, and an adjustment device 600 which adjusts the position of the light source 100 based upon the effective light source distribution measured by the measurement device 1000. <P>COPYRIGHT: (C)2010,JPO&INPIT |
