| 摘要 |
PROBLEM TO BE SOLVED: To more easily perform the cleaning of an atomic layer growth device. SOLUTION: The upper part of a film deposition vessel 101 is provided with cleaning liquid introduction piping 110 for introducing a cleaning liquid into a film deposition chamber, and the cleaning liquid introduction piping 110 is provided with a valve 111. Further, the exhaust piping 107 is connected to cleaning liquid exhaust piping 112 in addition to the exhaust piping 108. The connection between the exhaust piping 107 and the exhaust piping 108 and the connection between the exhaust piping 107 and the cleaning liquid exhaust piping 112 are switchable by a switching valve 113. Further, by the switching valve 113, the exhaust piping 107 can be made into a state of being closed. COPYRIGHT: (C)2010,JPO&INPIT
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