METHOD OF MANUFACTURING ELECTRO-OPTICAL APPARATUS

摘要

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an electro-optical apparatus capable of certainly preventing poor etching of a semiconductor film caused by remaining contaminations, with the capability of certainly removing the contaminations deposited on a substrate in a process of resist trimming. Ž<P>SOLUTION: This method of manufacturing the electro-optical apparatus includes a step S1 to form a semiconductor film on the substrate; a step S2 to forme a resist on the semiconductor film and perform patterning of the resist to a predetermined shape; a step S3 to trim the patterned resist to a predetermined size; a step S4 to clean the substrate with pure water; and a step S5 to etch the semiconductor film. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž