摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having excellent lithography characteristics and obtaining a resist pattern of good shape, and a method for forming a resist pattern by using the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) having increased solubility to an alkali developing solution by the action of an acid, an acid generator component (B) generating an acid by exposure, and a nitrogen-containing organic compound component (D). The base component (A) contains a polymer compound (A1) that has a structural unit including -SO<SB>2</SB>- in a cyclic skeleton and includes an acid-dissociable dissolution-inhibiting group in the structure of the compound. The resist composition contains at least two kinds of the nitrogen-containing organic compound components (D). <P>COPYRIGHT: (C)2010,JPO&INPIT |