发明名称 TOTAL REFLECTION ILLUMINATION TYPE SENSOR CHIP, MANUFACTURING METHOD OF SAME, AND SENSING METHOD USING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To prevent the leakage of light due to grinding marks which occur in a metal-film formed surface, which totally reflects measuring light, due to grinding in the detection of biological matter using evanescent waves. <P>SOLUTION: A total reflection illumination type sensor chip includes a dielectric prism 10 and a metal film 14a formed in one surface of the dielectric prism 10. The metal film 14a is supplied with a sample S containing a substance to be detected A. Measuring light L is irradiated to an interface 10a between the dielectric prism 10 and the metal film 14a in such a way as to satisfy conditions of total reflection. The total reflection illumination type sensor chip is used for a detection method for detecting the substance to be detected A through the use of evanescent waves Ew generated by the irradiation of the measuring light L. Grinding marks in the metal-film formed surface 10a, the one surface in which the metal film 14a is formed, are provided with directivity in a prescribed direction. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010210451(A) 申请公布日期 2010.09.24
申请号 JP20090057319 申请日期 2009.03.11
申请人 FUJIFILM CORP 发明人 KIMURA TOSHIHITO
分类号 G01N21/64 主分类号 G01N21/64
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