| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve a problem of an exposure device for radiating exposure light from an opening of a mask while a substrate is moved in a fixed direction at a constant speed and drawing a stripe-like pattern on the substrate wherein the exposure region is required to be expanded out of a range to eliminate an incomplete exposure region because the incomplete exposure region occurs in an exposure start part and an exposure completion part when the positioning accuracy of the substrate is low. <P>SOLUTION: This exposure device includes a means for measuring the displacement between a reference pattern on the substrate and the mask with an optical means, detecting error angle between the substrate scanning direction and the pattern on the substrate, and setting an angle of a running light shielding plate unit. <P>COPYRIGHT: (C)2010,JPO&INPIT |
