发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having an electrode that has low-resistance ohmic property and high resistance properties with respect to acid or alkali corrosion, and to provide a method of manufacturing the devices. SOLUTION: A semiconductor device has a nitride semiconductor layer 1, and an electrode provided on the nitride semiconductor layer 1. The electrode has a first metal layer 2 provided on the nitride semiconductor layer 1, a second metal layer 3 provided on the first metal layer 2, and a third metal layer 4 provided on the second metal layer 3. The first metal layer 2 contains a metal, having adhesion with the nitride semiconductor layer 1 higher than that of the second metal layer 3. The second metal layer 3 contains a metal, having resistance lower than that of the first metal layer 2 and an ohmic property to the nitride semiconductor layer 1, and the third metal layer 4 contains a metal having a smaller ionization tendency than that of hydrogen. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010212406(A) 申请公布日期 2010.09.24
申请号 JP20090056136 申请日期 2009.03.10
申请人 MITSUBISHI ELECTRIC CORP 发明人 IMAI AKIFUMI;OISHI TOSHIYUKI;FUKITA MUNEYOSHI;NANJO TAKUMA;ABE YUJI;YAGYU EIJI;MIYAKUNI SHINICHI
分类号 H01L21/28;H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/28
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