| 摘要 |
PROBLEM TO BE SOLVED: To provide a remote plasma CVD machine which can feed a raw material gas for growing a CNT (Carbon Nano-Tube) in vapor phase to a substrate at a fixed flow rate, and is excellent in maintainability. SOLUTION: The remote plasma CVD machine M is provided with: a chamber body 1a opened to the upper part having a substrate stage 3 mounted with the substrate S to be treated; a cover body 1b mounted at the opening of the upper face of the chamber body freely attachably/detachably; a plasma generation means 7 generating plasma at the inside of the chamber body; and a planar shielding member 8c with a plurality of through-holes provided at the upper part of the substrate in such a manner that the substrate on the substrate stage is not exposed to the plasma. The peripheral part at the lower face of the cover body is provided with a plurality of supporting members 8a saggingly provided at intervals in the circumferential direction, and supporting frames 8b connected to the lower edge parts of the supporting members, and the peripheral part of the shielding member is mounted in such a manner that the thermal expansion or thermal shrinkage of the shielding member is allowable to the supporting frame. COPYRIGHT: (C)2010,JPO&INPIT
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