| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a shower head and a plasma processing apparatus, which can efficiently execute uniform plasma processing by preventing diffusion of the plasma, even when employing a structure which supplies a gas from the shower head and discharges it from the shower head. <P>SOLUTION: The shower head 100 is provided on a processing chamber 201 for processing a substrate in the inside so as to face a placing table 202 for placing the substrate and supply a gas like shower toward the substrate from a plurality of gas jetting holes 11 equipped on the opposite surface facing the placing table. The shower head 11 includes: a plurality of exhaust holes 13 provided to penetrate between an opposite surface and a surface reverse to the opposite surface, and discharging the gas from the opposite surface to the reverse surface; and a plurality of electrodes 16 provided on the surface reverse to the opposite surface and applied with a voltage for ion confinement. <P>COPYRIGHT: (C)2010,JPO&INPIT |
