| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin film transistor array that can form a semiconductor film precisely at a predetermined position to suitable film thickness and has excellent productivity, and to provide the thin film transistor array. SOLUTION: The method of manufacturing the thin film transistor array includes the processes of: forming, on the surface of a base layer, a barrier layer which has higher liquid repellency to a semiconductor solution than surfaces of a source electrode and a drain electrode formed on the surface of the base layer so as to surround the source electrode and drain electrode formed on the surface of the base layer; forming the semiconductor film in the region surrounded with the barrier layer by applying the semiconductor solution; connecting the source electrode and a source bus to each other via a contact hole formed in any of the upper layer and the lower layer of the source electrode; and connecting the drain electrode and a pixel electrode to each other via a contact hole formed in any of the upper layer and the lower layer of the drain electrode. COPYRIGHT: (C)2010,JPO&INPIT |
