| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the generation of particles caused by material supply owing to insufficient vaporization of liquid material, and to prevent a drop of device working rate because of clogging by suppressing the generation of particles in a vaporizer and clogging of a nozzle. Ž<P>SOLUTION: The substrate processing apparatus includes: a processing chamber 203 for housing a substrate; a liquid material housing section 300 for housing a liquid material; a vaporizing mechanism 304 for vaporizing the liquid material; liquid material gas supply piping 250h and 250j for connecting the vaporizing mechanism to the processing chamber; a liquid material supply piping 250e, 250f and 250g for connecting the liquid material housing section to the vaporizing mechanism; and a preheating section 302 that is provided in the liquid material supply piping and heats and houses the liquid material. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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