| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light irradiation apparatus for suppressing a relative movement amount between a light emitting means and an adherend so as to make the apparatus compact, and for shortening a light irradiation time so as to drastically improve an irradiation efficiency. <P>SOLUTION: The light irradiation apparatus 10 is equipped with: a table 11 for supporting a semiconductor wafer W on which an adhesive sheet S constituting a body to be irradiated is stuck; the light emitting means 12 for irradiating the adhesive sheet S with light; and a moving means 13 for relatively moving the table 11 and the light emitting means 12 in mutually parallel planes. In the light emitting means 12, line light L along a direction to be intersected with a relative movement direction with the table 11 is formed on a surface S1 to be irradiated in the adhesive sheet S. The plurality of light emitting means 12 are arranged along the relative movement direction at prescribed intervals Px or prescribed angles θ. <P>COPYRIGHT: (C)2010,JPO&INPIT |
