发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a charged particle beam device for measuring correct sample surface potential or adjusting a focus in accordance with the potential of the sample surface without the irradiation of charged particle beams on the sample. <P>SOLUTION: The charged particle beam device includes a charged particle source, an objective lens which focuses the charged particle beams emitted from the charged particle source and irradiates the beams on the sample, a negative potential applying power source which forms an electric field for decelerating charged particle beams reaching the sample by the application of a negative voltage, and a control device which achieves the focus adjustment of the charged particle beams by controlling the negative potential applying power source. The control device determines the sample potential on the basis of solid state property data and the scanning state of the charged particle beams of the sample, and controls the negative potential applying power source on the basis of the surface potential. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010211973(A) 申请公布日期 2010.09.24
申请号 JP20090054369 申请日期 2009.03.09
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TSUCHIYA TSUGUTOSHI;YOKOSUKA TOSHIYUKI;TAGO KAZUATSU;RI AKIRA;KOBAYASHI KINYA
分类号 H01J37/21 主分类号 H01J37/21
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