发明名称 POLYIMIDE POLYMER, ITS COPOLYMER, AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a polyimide polymer and/or its copolymer, and a positive photosensitive resin composition containing the same as a binder resin. <P>SOLUTION: The photosensitive resin composition containing a polyimide polymer derived from a 3,4-dicarboxy-1,2,3,4-tetrahydro-6-t-butyl-1-naphthalene succinic dianhydride has high resolution, high sensitivity, and the excellent film characteristics and mechanical properties as the characteristics required for a semiconductor buffer coating. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010209334(A) 申请公布日期 2010.09.24
申请号 JP20100053492 申请日期 2010.03.10
申请人 LG CHEM LTD 发明人 KIM SUN WOO;PARK CHAN HYO;KIM KYUNG JUN;SEONG HYE RAN;SHIN SE JIN;OH DONG HYUN
分类号 C08G73/10;G03F7/004;G03F7/022;G03F7/023 主分类号 C08G73/10
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