发明名称 LITHOGRAPHY APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of efficiently sealing liquid between different regions on a substrate table. <P>SOLUTION: The substrate table includes a cover plate 100 disposed on the top surface of a substrate table body MB. Having a flat and continuous top surface, the cover plate 100 can be applied to a local region-type liquid supply system. The top surface of the cover plate 100 is substantially coplanar with that of a substrate W. This makes it possible to install a seal projection portion 200 for reducing or preventing the entry of liquid into a recess between a substrate support SS and the substrate table body MB. The seal projection portion 200 connects between the bottom internal edge of the cover plate 100 and the top surface of the substrate support SS. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010212711(A) 申请公布日期 2010.09.24
申请号 JP20100101340 申请日期 2010.04.26
申请人 ASML NETHERLANDS BV 发明人 MARIA HENNUS PIETER R;MERTENS JEROEN JOHANNES SOPHIA MARIA;CORNELUS HENDRIK SMULDERS PATRICK J;SMITS PETER
分类号 H01L21/027;H01L21/683 主分类号 H01L21/027
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