| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning device, wherein a rate of the part where a rotary direction of a cleaning brush and that of a substrate become the same in a substrate face, becomes remarkably small, variations of cleaning performance in the substrate face caused by existence of parts whose rotary directions are the same and parts whose rotation directions are reverse are small, and a high cleaning effect is obtained. Ž<P>SOLUTION: The substrate cleaning device 20 is provided with: a substrate rotation means 30 holding the substrate 1 and rotating the substrate 1; a pair of brushes 40 (50) which have two cleaning brushes 7 and 8 (10) arranged in parallel to an extending direction of a brush rotation axis which is parallel to the substrate face and crosses a substrate rotation axis (a), and in which the two cleaning brushes 7 and 8 (10) rotate in opposite directions with the brush rotation axis as a center, and the cleaning brushes 7 and 8 (10) rotate in the opposite directions of the rotation direction of the substrate 1; and a brush driving means 12 rotating a pair of brushes and reciprocating a pair of brushes in the extending direction of the brush rotation axis. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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