发明名称 FILM DEPOSITION MASK, AND APPARATUS FOR MANUFACTURING ORGANIC EL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a film deposition mask which can achieve excellent adhesion to the substrate to be film-deposited held in a space with a magnet, and to provide an apparatus for manufacturing an organic EL device provided therewith. Ž<P>SOLUTION: The vapor deposition apparatus 100 as a production apparatus for an organic EL device is provided with: at least one chamber 111; a vapor deposition source 110 provided at the inside of the chamber 111 and evaporating a film formation material; and a substrate holding part 113 holding a substrate W to be film-deposited so as to be confronted with the vapor deposition source 110, and the substrate W is, in the substrate holding part 113, held between each magnet 117 and each mask 50 for film deposition having an opening part 50a corresponding to the film deposition area E of the substrate W and further having coercive force reaching saturated magnetization to the magnetic flux density of the magnet 117. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010209441(A) 申请公布日期 2010.09.24
申请号 JP20090059058 申请日期 2009.03.12
申请人 SEIKO EPSON CORP 发明人 YOTSUYA SHINICHI
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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