发明名称 GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY
摘要 A method of forming a device using a graded anti-reflective coating is provided. One or more amorphous carbon layers are formed on a substrate. An anti-reflective coating (ARC) is formed on the one or more amorphous carbon layers wherein the ARC layer has an absorption coefficient that varies across the thickness of the ARC layer. An energy sensitive resist material is formed on the ARC layer. An image of a pattern is introduced into the layer of energy sensitive resist material by exposing the energy sensitive resist material to patterned radiation. The image of the pattern introduced into the layer of energy sensitive resist material is developed.
申请公布号 US2010239979(A1) 申请公布日期 2010.09.23
申请号 US20100797406 申请日期 2010.06.09
申请人 YEH WENDY H;SEAMONS MARTIN J;SPULLER MATTHEW;TANG SUM-YEE BETTY;LEE KWANGDUK DOUGLAS;RATHI SUDHA 发明人 YEH WENDY H.;SEAMONS MARTIN J.;SPULLER MATTHEW;TANG SUM-YEE BETTY;LEE KWANGDUK DOUGLAS;RATHI SUDHA
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
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