EXHAUST GAS CLEANING DEVICE

摘要

An exhaust gas cleaning device (4) comprises a plasma reactor (7) having a gas flow channel (28) through which exhaust gas passes and a power supply (8) which inputs power to the plasma reactor (7), in which the applied voltage of the input power and/or the frequency of the applied voltage is variable. In the exhaust gas cleaning device (4), in accordance with the variation in the amount of PM passing through the gas flow channel (28) and/or the gas flow rate, the applied voltage and/or the pulse repetition frequency (PRF) of the applied voltage is changed. It is thereby possible to suppress the consumption of discharge power while efficiently oxidizing the PM in the exhaust gas.