Method for controlling plasma density distribution in vacuum process for treating substrate, arranging multiple anodes adjacent to cathode in vacuum chamber, such that plasma area is defined

摘要

The method arranging multiple anodes (11,11',21,21') adjacent to a cathode (4) in a vacuum chamber, such that a plasma area is defined. The plasma discharge is generated in the plasma area. The power supply (7) of the individual anodes is controlled, such that the anode current (10) of the anode of a series of adjacent anodes has a current value between a maximum current value and zero, and the anode current of another anode of the series has a different current value. An independent claim is also included for a device for controlling a plasma density distribution in a vacuum process for treating a substrate.