发明名称 MATRIX FOR DETECTION/ANALYSIS OF RESIDUES
摘要 Provided is a device and method for detecting the presence of a material in a gaseous medium, including a reaction assembly including at least one detection unit including a matrix adapted for exposure to the gaseous medium, such that at least part of the gaseous medium comes into contact with the matrix; the matrix being configured for capturing a gas-borne particle of a material carried by the gaseous medium, and for permitting a liquid or solute reagent to come in contact with the matrix, thereby enabling said liquid reagent to react with said particle to yield an optically altered reaction product.
申请公布号 US2010238447(A1) 申请公布日期 2010.09.23
申请号 US20080741279 申请日期 2008.11.03
申请人 APHELION LTD. 发明人 HIRSCH ISRAEL
分类号 G01N31/22 主分类号 G01N31/22
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