NEGATIVE-WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

The object of the present invention is to provide a negative-working resist composition that forms a well-shaped pattern with no decrease in resolution at high sensitivity, and a pattern forming method using the negative-working resist composition. This object has been achieved by a negative-working resist composition comprising a calix resorcinarene derivative (A) of specific structure, an acid generator (B) which directly or indirectly generates an acid when exposed to an active energy ray having a wavelength of 248 nm or less, and a cross-linking agent (C).