发明名称 RAW MATERIAL GAS SUPPLY SYSTEM AND FILM FORMING APPARATUS
摘要 A raw material gas supply system (6) supplies a raw material gas to a gas use system (2) kept in a reduced pressure atmosphere. The system includes: a raw material tank (40) for storing a liquid raw material or a solid raw material; a raw material conduit (46) connected at one end to the raw material tank and connected at the other end to the gas use system; a carrier gas supply mechanism (54), connected to the raw material tank, for supplying a carrier gas into the raw material tank while controlling the flow rate of the gas; on-off valves (48, 50) interposed in the raw material conduit; a heater (64) for heating the raw material conduit and the on-off valves; and a temperature control device (92) for controlling the heater, wherein the raw material conduit and the on-off valves are each formed of a metal material having good thermal conductivity.
申请公布号 US2010236480(A1) 申请公布日期 2010.09.23
申请号 US20080680041 申请日期 2008.09.22
申请人 TOKYO ELECTRON LIMITED 发明人 HARA MASAMICHI;GOMI ATSUSHI;MAEKAWA SHINJI;YAMAMOTO KAORU;TAGA SATOSHI
分类号 C23C16/54;F15D1/00 主分类号 C23C16/54
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