发明名称 RESISTIVE RANDOM ACCESS MEMORY, NONVOLATILE MEMORY, AND METHOD OF MANUFACTURING RESISTIVE RANDOM ACCESS MEMORY
摘要 A resistive random access memory includes a lower electrode; a metal oxide film formed on the lower electrode and having a variable resistance, the metal oxide film having a first portion containing a metal element forming the metal oxide film and a second portion richer in oxygen than the first portion; and an upper electrode formed on the metal oxide film.
申请公布号 US2010237317(A1) 申请公布日期 2010.09.23
申请号 US20100793270 申请日期 2010.06.03
申请人 FUJITSU LIMITED 发明人 TSUNODA KOJI
分类号 H01L45/00;H01L21/16 主分类号 H01L45/00
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