发明名称 |
Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
摘要 |
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.
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申请公布号 |
US2010237243(A1) |
申请公布日期 |
2010.09.23 |
申请号 |
US20100789070 |
申请日期 |
2010.05.27 |
申请人 |
EBARA CORPORATION |
发明人 |
NOJI NOBUHARU;SATAKE TOHRU;SOBUKAWA HIROSI;KIMBA TOSHIFUMI;HATAKEYAMA MASAHIRO;YOSHIKAWA SHOJI;MURAKAMI TAKESHI;WATANABE KENJI;KARIMATA TSUTOMU;SUEMATSU KENICHI;TABE YUTAKA;TAJIMA RYO;TOHYAMA KEIICHI |
分类号 |
G01N23/22;G01N23/225;H01J37/05;H01J37/28 |
主分类号 |
G01N23/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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