发明名称 |
Method for Using Compositions Containing Fluorocarbinols in Lithographic Processes |
摘要 |
The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
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申请公布号 |
US2010239985(A1) |
申请公布日期 |
2010.09.23 |
申请号 |
US20100794208 |
申请日期 |
2010.06.04 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BREYTA GREGORY;SANDERS DANIEL PAUL;TRUONG HOA D. |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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