发明名称 SILICIDE - COATED METAL SURFACES AND METHODS OF UTILIZING SAME
摘要 <p>In an embodiment, a surface of the present invention comprises of at least one base layer, wherein the at least one base layer contains at least one silicide-forming metal element; and at least one suicide coating layer, wherein the at least one suicide coating layer is formed by a process of: i) exposing the at least one base layer having a sufficient amount of the at least one silicide-forming metal element to a sufficient amount of at least one silicon source gas having a sufficient amount of silicon element, ii) reacting the sufficient amount of the at least one silicide-forming metal element with the sufficient amount of silicon element, and iii) forming the at least one suicide coating layer.</p>
申请公布号 WO2010108065(A1) 申请公布日期 2010.09.23
申请号 WO2010US27911 申请日期 2010.03.19
申请人 AE POLYSILICON CORPORATION;FROEHLICH, ROBERT;FIESELMANN, BEN;MIXON, DAVID;TSUO, YORK 发明人 FROEHLICH, ROBERT;FIESELMANN, BEN;MIXON, DAVID;TSUO, YORK
分类号 H01L21/285 主分类号 H01L21/285
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