摘要 |
<p>In an embodiment, a surface of the present invention comprises of at least one base layer, wherein the at least one base layer contains at least one silicide-forming metal element; and at least one suicide coating layer, wherein the at least one suicide coating layer is formed by a process of: i) exposing the at least one base layer having a sufficient amount of the at least one silicide-forming metal element to a sufficient amount of at least one silicon source gas having a sufficient amount of silicon element, ii) reacting the sufficient amount of the at least one silicide-forming metal element with the sufficient amount of silicon element, and iii) forming the at least one suicide coating layer.</p> |
申请人 |
AE POLYSILICON CORPORATION;FROEHLICH, ROBERT;FIESELMANN, BEN;MIXON, DAVID;TSUO, YORK |
发明人 |
FROEHLICH, ROBERT;FIESELMANN, BEN;MIXON, DAVID;TSUO, YORK |