MASKING TAPE AND METHOD FOR PROCESSING WAFER SURFACE

摘要

Disclosed is a masking tape which has excellent adhesion at room temperature, while exhibiting high adhesion even in high-temperature water of 80-100°C. The masking tape can be easily removed after use. Specifically disclosed is a masking tape which is composed of a base and an adhesive layer formed on one surface of the base. The masking tape exhibits high adhesion even in high-temperature water of 80-100°C, and can be easily removed after use. The adhesive layer contains a copolymer which has a glass transition temperature of from -5°C to 15°C and contains at least a segment derived from an alkyl acrylate ester having an alkyl group with 5 or less carbon atoms, a segment derived from an acrylic monomer a homopolymer of which has a glass transition temperature of 80-120°C, and a segment having a radically polymerizable unsaturated bond in a side chain.