POSITIONING METHOD AND VAPOR DEPOSITION METHOD

摘要

Positioning of a shadow mask relative to a substrate is made accurate. The periphery of a substrate (20) is placed on a substrate-supporting part (136), and the substrate, in which the center part is bent down, is disposed on a shadow mask (30). After the bending has disappeared, the peripheral part is held. The substrate (20) which is not bent is separated from the shadow mask (30), and first positioning is conducted. Positioning with satisfactory accuracy can be conducted because there is no bending. After the first positioning, the substrate (20) is brought into close contact with the shadow mask (30) and second positioning is conducted, which brings about higher accuracy.