| 摘要 |
The metal structure that is obtained by a process, comprises a flat substrate made of non-conductive fibers, which form a cross-linked thread-structure, where the substrate is a non-woven and is metallized with a metal on one side, so that a conductive metal layer is completely formed on all sides from each intersection point of the substrate and the substrate is removed following the finished formation of the metal layer. The metallization process is carried out at a temperature below 200[deg] C. The formed metal layer is reinforced to a thickness of up to 50 mu m by galvanization. The metal structure that is obtained by a process, comprises a flat substrate made of non-conductive fibers, which form a cross-linked thread-structure, where the substrate is a non-woven and is metallized with a metal on one side, so that a conductive metal layer is completely formed on all sides from each intersection point of the substrate and the substrate is removed following the finished formation of the metal layer. The metallization process is carried out at a temperature below 200[deg] C. The formed metal layer is reinforced to a thickness of up to 50 mu m by galvanization following the metallization. The substrate is separated from the metal layer using a solvent or is removed by thermal decomposition. The remaining metal structure is subsequently cleaned in alkali and/or acid aqueous solutions. |
