| 摘要 |
<p>A plasma generation source constitutes a VHF plasma CVD device using a power source having a frequency band of 30 MHz to 300 MHz. Provided is a large-area and uniform VHF plasma CVD device which can suppress effects of a stationary wave, generation of harmful plasma generated other than between a pair of electrodes, and power consumption other than between the pair of electrodes. Provided is also a method for the VHF plasma CVD. The distance between a first and a second power supply point which are arranged at the two ends of the electrode is set to a quarter of a wavelength of the used power multiplied by an odd number. Two pulse powers which are temporally separated from each other are supplied from the both ends of the electrode via a balance/unbalance converter, respectively, so as to temporally alternately generate a first stationary wave having a loop positioned at the center of the electrode and a second stationary wave having a knot positioned at the center of the electrode.</p> |
