发明名称 ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME
摘要 To provide an electrode patterning layer to be used for forming an electrode pattern of any optional shape depending on the difference in wettability with an electrode-forming solution, the electrode patterning layer employing a polyimide type resin which is highly reliable as an electronic material. An electrode patterning layer to be used for forming an electrode pattern of any desired shape depending on the difference in wettability with an electrode-forming solution, said electrode patterning layer being prepared by irradiating a layer comprising a polyamic acid having repeating units represented by the following formula (1) or a polyimide obtainable by cyclodehydration of such a polyamic acid, with ultraviolet ray in a pattern shape: wherein A is a tetravalent organic group, B is a bivalent organic group, each of A and B may be of a single type or plural types, and n is a positive integer, provided that at least one type of A is a tetravalent organic group having an alicyclic structure.
申请公布号 EP1898451(A4) 申请公布日期 2010.09.22
申请号 EP20060766922 申请日期 2006.06.19
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 MAEDA, SHINICHI;ONO, GO
分类号 H01L21/28;C08G73/10;G03F7/038;H01L21/288;H01L21/3205;H01L21/336;H01L29/786 主分类号 H01L21/28
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