| 摘要 |
<p>PURPOSE: A photomask for the damascene process and manufacturing method thereof is the protrusion of the first thickness on the transparent substrate and transparent substrate. CONSTITUTION: A mask film pattern, the chrome(Cr) film are included. In the protrusion of the first thickness of the mask film pattern, the light source is quarantined. The mask film is formed in the top of the substrate(100). The resist film is formed on the mask film.</p> |
