POLYIMIDE-BASED POLYMER AND COPOLYMER THEREOF, AND POSITIVE TYPE PHOTORESIST COMPOSITION COMPRISING THE SAME

摘要

PURPOSE: A polyimide-based polymer, a copolymer thereof, and a positive type photoresist resin composition including thereof are provided to secure the proper solubility for an alkaline developing solution, and to secure the high definition of a photosensitive resin composition. CONSTITUTION: A photosensitive polyimide-based polymer is a compound selected from the group consisting of compounds marked with chemical formula 1~3. In the chemical formulas, Z is a tetravalent organic group forming tetracarboxylic acid and its derivative, including 1~100mole% of 3,4-dicarboxy-1,2,3,4-tetrahydro-6-tertiary-butyl-1-naphthalene succinic dianhydride. Y2 is either a divalence aliphatic group or an aromatic organo group.