发明名称 METHOD OF MANUFACTURING NEAR FIELD LIGHT GENERATION ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To obtain a manufacturing method for providing a near field light generation element which has high light utilization efficiency, and which facilitates ultra-high-accuracy alignment of luminous flux supplied to the near field light generation element and a minute opening, or which requires no alignment, and which is mass-produced at a low cost, in an optical memory device, observation device, etc., using near field light. Ž<P>SOLUTION: The method of manufacturing the near field light generation element includes: a light guiding structure fabrication process 101; a light collecting structure fabrication process 102 in which luminous flux for fabricating a convex shape is irradiated from a surface other than the surface on which a convex shaped part is planned to be fabricated; a convex shape fabrication process 201; and a minute opening fabrication processes 105. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010204127(A) 申请公布日期 2010.09.16
申请号 JP20100143409 申请日期 2010.06.24
申请人 SEIKO INSTRUMENTS INC 发明人 KASAMA NOBUYUKI;OMI MANABU;MITSUOKA YASUYUKI;MAEDA HIDETAKA;KATO KENJI;NIWA TAKASHI
分类号 G01Q60/22;G01Q80/00 主分类号 G01Q60/22
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