发明名称 GROUP III-V DEVICES WITH DELTA-DOPED LAYER UNDER CHANNEL REGION
摘要 A group III-V material device has a delta-doped region below a channel region. This may improve the performance of the device by reducing the distance between the gate and the channel region.
申请公布号 WO2010074906(A3) 申请公布日期 2010.09.16
申请号 WO2009US66432 申请日期 2009.12.02
申请人 INTEL CORPORATION;HUDAIT, MANTU K.;TOLCHINSKY, PETER G.;CHAU, ROBERT S.;RADOSAVLJEVIC, MARKO;PILLARISETTY, RAVI;BUDREVICH, AARON A. 发明人 HUDAIT, MANTU K.;TOLCHINSKY, PETER G.;CHAU, ROBERT S.;RADOSAVLJEVIC, MARKO;PILLARISETTY, RAVI;BUDREVICH, AARON A.
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址