发明名称 METHOD AND APPARATUS FOR TREATING EMISSION
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and apparatus for treating emission capable of stably and efficiently treating an organic halogen compound for a long period of time. <P>SOLUTION: An organic halogen compound is biologically removed by feeding emission comprising an organic halogen compound into a gas treatment column 24 via an emission pipeline 12 to bring the emission into contact with a microorganism layer 25 in which a decomposing microorganism decomposing an organic halogen compound is carried on the carrier 64, while spraying a liquid 76 from a spray pipe 26 onto the microorganism layer 25 to carry out the treatment of the emission keeping the microorganism layer 25 in a wet condition. The liquid 76 sprayed onto the microorganism layer 25 is recovered in a tank 28 disposed at the bottom of the gas treatment column 24. A collecting material 66 that collects the decomposition microorganism (a biofilm coming off and falling from the support 64) in the liquid 76 present in the tank 28 is disposed therein. The liquid 76 removed of the decomposition microorganism by virtue of the collecting material 66 is recycled to the spray pipe 26, and is sprayed onto the microorganism layer 25 again. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010201314(A) 申请公布日期 2010.09.16
申请号 JP20090048282 申请日期 2009.03.02
申请人 FUJIFILM CORP 发明人 MIYAZAKI HIDEO;OKADA TETSUAKI
分类号 B01D53/70;B01D53/34;C12N1/20 主分类号 B01D53/70
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