发明名称 METHOD OF MANUFACTURING PHOTOELECTRIC CONVERTER AND METHOD OF MANUFACTURING ELECTRONIC EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process for enabling conformal film formation reflecting a texture structure even if adopting the texture structure for photoelectric converters having satisfactory characteristics, especially quantum dot type solar cells. <P>SOLUTION: A method of manufacturing photoelectric converters includes: a first process for changing a liquid semiconductor material containing nanoparticles (d) into mist for depositing on an underlayer (3) having irregularities to form a deposited film on the underlayer (3); and a second process for forming a semiconductor film (7) containing nanoparticles in a dispersed state on the underlayer by heat-treating the deposited film. By the method, the liquid semiconductor material containing nanoparticles is changed into mist for deposition, thus achieving conformal film formation, and hence manufacturing the photoelectric converter having satisfactory characteristics. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010206061(A) 申请公布日期 2010.09.16
申请号 JP20090051752 申请日期 2009.03.05
申请人 SEIKO EPSON CORP 发明人 FURUSAWA MASAHIRO
分类号 H01L31/04 主分类号 H01L31/04
代理机构 代理人
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