发明名称 ELECTROOPTICAL DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To simultaneously attain reduction in the cost required for manufacturing of an electrooptical device, like a liquid crystal and improvement of display performance. SOLUTION: A TFT (30) includes a semiconductor layer (30a), formed in the same layer as lower side capacity electrodes (80a) and (80b) on a TFT array substrate (10); a gate insulating film (30b) formed over the semiconductor layer; and a gate electrode (30c). The semiconductor layer (30a) is formed, such that its width along the substrate surface of the TFT array substrate (10) is larger than the thickness along the thickness direction of the TFT array substrate (10). Consequently, according to the TFT (30) and holding capacity (70), the TFT (30) can be formed by a step common to the lower side capacity electrodes (80a) and (80b), including a semiconductor, such as, polysilicon, when manufacturing a liquid crystal (1); and thus the manufacturing process of the liquid crystal device (1) can be simplified, and the manufacturing cost can be reduced. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010204600(A) 申请公布日期 2010.09.16
申请号 JP20090053047 申请日期 2009.03.06
申请人 SEIKO EPSON CORP 发明人 OBA KAZUYUKI
分类号 G02F1/1368;G02F1/1343;H01L21/822;H01L27/04;H01L29/786 主分类号 G02F1/1368
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