| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a carbon film which suppresses a residual stress on the interface between a carbon film and a substrate, prevents cracks or peeling of the carbon film and stably maintains performances, a production method of the carbon film, and a CMP (chemical mechanical polishing) pad conditioner. <P>SOLUTION: The carbon film 2 covers a substrate 1 and includes a first carbon film 11 comprising DLC (diamond-like carbon), a second carbon film 12 comprising diamond particles having an average particle diameter of 200 nm or less, and a third carbon film 13 comprising diamond particles having an average particle diameter of over 200 nm, wherein the first, second and third carbon films 11, 12, 13, respectively, are formed in this order from the substrate 1 side. <P>COPYRIGHT: (C)2010,JPO&INPIT |
