| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light intensity measuring apparatus capable of measuring light intensity of entire luminous flux of exposure light emitted from an optical element, to provide an exposure apparatus, and to provide a device manufacturing method. <P>SOLUTION: A quantity-of-light measuring device is provided in an exposure apparatus for exposing an image corresponding to a pattern formed on a surface to be irradiated with light onto a substrate by irradiating the surface with exposure light emitted from light source equipment. The quantity-of-light measuring device includes: a displacement member 39 capable of receiving one portion of the exposure light; and a displacement mechanism for displacing the displacement member 39 in a first direction within a prescribed surface across an optical path of the exposure light. The displacement member 39 has an opening 45 larger in a second direction crossing a first direction than in the first direction. <P>COPYRIGHT: (C)2010,JPO&INPIT |
