ALIGNMENT APPARATUS, SUBSTRATES STACKING APPARATUS, STACKED SUBSTRATES MANUFACTURING APPARATUS, EXPOSURE APPARATUS AND ALIGNMENT METHOD

摘要

The throughput of the alignment in an alignment apparatus is improved. There is provided an alignment apparatus for aligning a substrate having an alignment mark, including a first aligner that aligns the substrate to a first reference position, a second aligner that aligns a substrate holder to a second reference position before the substrate holder holds the substrate, and a position detector that detects a position of the alignment mark of the substrate after the substrate holder holds the substrate.