A solution containing polymer-bound metal nanoparticles is deposited onto a substrate, at least the surface of which is insulating, to form a pattern, the substrate is dried, and then the pattern is subjected to plasma exposure.
申请公布号
US2010233384(A1)
申请公布日期
2010.09.16
申请号
US20070293703
申请日期
2007.03.20
申请人
JAPAN SCIENCE AND TECHONOLOGY AGENCY;OSAKA UNIVERSITY
