| 摘要 |
A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on a lower surface of the photomask substrate, for determining locations of defects in the photomask pattern.
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