发明名称 PRODUCTION OF INTEGRATED CIRCUITS COMPRISING SEMICONDUCTOR INCOMPATIBLE MATERIALS
摘要 It is described a procedure for the integration of semiconductor incompatible materials in a process family created for the production of passive electric components and active electric components formed within integrated circuits. The procedure is applicable in known techniques like bipolar, MOS or BIMOS processes for semiconductor production. The modular concept of the described procedure may combine diodes, resistors and capacitors, which components are made from different materials. The provision of an encapsulation material for a semiconductor incompatible material enables the manufacturing of integrated circuits even within a sensitive environment with respect to contaminations originating from the semiconductor incompatible material. The encapsulation is provided early within the manufacturing process such that the risk for a contamination may be reduced to a minimum. Further, it is described an integrated circuit element and an integrated circuit comprising an encapsulated semiconductor incompatible material. The semiconductor incompatible material may be a lead containing ceramics, in particular Lead Lanthanum Zirconium Titanate (PLZT), which is used for ferroelectric capacitors and which represents a highly contaminating substance in particular for ‘heavy metal sensitive’ environments.
申请公布号 US2010230786(A1) 申请公布日期 2010.09.16
申请号 US20070161707 申请日期 2007.01.25
申请人 NXP B.V. 发明人 SCHNITT WOLFGANG
分类号 H01L29/92;H01L21/02;H01L23/28 主分类号 H01L29/92
代理机构 代理人
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