| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition having a high transmittance to light at a wavelength of 170 nm or less, suitable particularly for use in F<SB>2</SB>excimer laser lithography. <P>SOLUTION: The chemical amplification resist composition contains a binder resin and a radiation-sensitive compound, wherein the binder resin is soluble in alkali by itself or becomes soluble in alkali by a chemical change caused by the action of the radiation-sensitive compound after irradiation and has a polymerization unit derived from a monomer of formula (1). In the formula, Q represents hydrogen or methyl; and R<SP>1</SP>represents 1-14C fluoroalkyl having a hydroxyl group substituted for at least one fluorine atom. <P>COPYRIGHT: (C)2010,JPO&INPIT |
