| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of suppressing the occurrence of an exposure defect by suppressing the remain of a liquid or the like. <P>SOLUTION: The exposure device includes: an optical system having an emission surface for emitting exposure light; a first collection hole arranged at least a portion of a periphery of an optical path of the exposure light emitted from the emission surface; a first liquid supply hole arranged outside the first collection hole in the emission direction to the optical axis of the optical system to supply a first liquid; and a first inlet arranged outside the first liquid supply hole in the emission direction to the optical axis of the optical system to supply a gas. In at least a portion of exposure of the substrate, the surface of the substrate faces the first collection hole, first liquid supply hole, and first inlet, and the substrate is exposed by the exposure light from the emission surface through a second liquid between the emission surface and the surface of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
