| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad improving the cyclicity of a polishing liquid and reducing occurrence of scratches. <P>SOLUTION: The polishing pad 20 includes a urethane sheet 5. The urethane sheet 5 has a nap sheet 5a obtained by the wet deposition method. The nap sheet 5a is covered with a fiber cover 5b formed of nano short fibers made of polyurethane resin. The nap sheet 5a includes numerous cells 4. The nap sheet 5a has a sheet face 7 positioned on a side of a material to be polished during polishing. The sheet face 7 has apertures 3 formed of apertures of the cells 4. The fiber cover 5b has the nano short fibers directly covering an entire resin surface on the sheet face 7 and internal faces of the cells 4. The opposite face of the nap sheet 5a, of the fiber cover 5b forms a polishing surface P for polishing the material to be polished. The apertures are secured on the polishing surface P. <P>COPYRIGHT: (C)2010,JPO&INPIT |
