| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a blank for a reflective photomask, which is clean against outgas components existing in a mask case made of resin and in clean room environment and can form minute patterns without contaminating inside an exposing device; and to provide the reflective photomask. <P>SOLUTION: The blank for a reflective photomask is clean to outgas components existing in a mask case made of resin and in clean room environment and can form minute patterns without contaminating inside an exposing device by including a protective film coated so that the outgas components may not adhere to the whole surface of the surroundings. The reflective photomask is also provided. <P>COPYRIGHT: (C)2010,JPO&INPIT |
